Modification of nanolayers in high-frequency plasma of low pressure
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The work is devoted to the modification of the surface layer of metals, their alloys, semiconductors, dielectrics, thin-film coatings using high-frequency discharges of induction and capacitive types under reduced pressure . Describes the physical and mathematical model of modification of the surface of materials in high-frequency plasma of low pressure, as well as the results of a theoretical study of the patterns of formation of the main parameters of the modification process.
LF/169252/R
Data sheet
- Name of the Author
- Абдуллин И. Ш.
Желтухин В. С.
Казан. гос. технол. ун-т
Сагбиев И. Р.
Шаехов М. Ф. - Language
- Russian
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The work is devoted to the modification of the surface layer of metals, their alloys, semiconductors, dielectrics, thin-film coatings using high-frequency disch...